Characterization of Al Incorporation into HfO2 Dielectric by Atomic Layer Deposition

Md Mamunur Rahman1, Jun-Gyu Kim2, Dae-Hyun Kim3

  • 1School of Electrical Engineering, University of Ulsan, Ulsan 44610, Korea. rahman.mamun37@gmail.com.

Micromachines
|June 2, 2019
PubMed

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