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A novel method for EBT3 Gafchromic films read-out at high dose levels
Patrizio Vaiano1, Marco Consales1, Pierluigi Casolaro2
1Optoelectronics Group - Department of Engineering, University of Sannio, I-82100 Benevento, Italy.
Abstract:
In this work, we report on a novel approach for measuring the dose absorbed by the EBT3 Gafchromic™ films exposed to 1 MeV electron beam and 250 kV X-rays in the range 0.5-100 Gy. Although EBT3 is specifically designed to obtain best performance for applications where the maximum dose is less than 10 Gy, there are certain clinical applications requiring dose ranges well above this value. In order to cover wider dose ranges, further models characterized by a thinner sensitive layer and/or different chemical composition have been released. Another method exploiting the three-channel flatbed scanner to delay the saturation point of EBT3 has been also reported. The technique proposed here, aimed at extending the sensitivity of the EBT3 film to high doses up to 100 Gy while ensuring a low dose uncertainty, is based on a broadband analysis of the absorption spectrum of the film in response to irradiation. By combining a wavelength-based approach with the monitoring of two characteristic peaks of the EBT3 absorption spectrum, we demonstrated the capability of measuring the dose in the range 0.5-100 Gy with an experimental uncertainty below 4% for doses lower than 5.52 Gy and below 2% for higher dose levels. Finally, through a dynamic fitting procedure integrating the two aforesaid approaches, a total uncertainty lower than 4%, including both the experimental and fitting errors, was achieved in the whole range 0.5-100 Gy. These results are promising in view of a potential application of this technique in the field of clinical dosimetry at high dose levels.
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