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One-Step Approach to Fabricating Polydimethylsiloxane Microfluidic Channels of Different Geometric Sections by Sequential Wet Etching Processes
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A new etching process for zinc oxide with etching rate and crystal plane control: experiment, calculation, and

Jiyong Chung1, Jeong Hee Lee2, Kyeounghak Kim3

  • 1Department of Chemical Engineering, College of Engineering, Kyung Hee University, Yongin 17140, Korea. jkim21@khu.ac.kr tkyu@khu.ac.kr.

Nanoscale
|June 20, 2019
PubMed

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