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High-contrast, high-brightness ultraviolet laser system
Optics Express
|June 30, 2019
Summary
This study details an improved ultraviolet laser system using KrF excimer amplifiers and nonlinear Fourier filtering. The enhanced system achieves high contrast and brightness for advanced laser-matter interaction experiments.
Area of Science:
- High-intensity laser physics
- Ultrafast optics
- Nonlinear optics
Background:
- Conventional short-pulse dye/excimer laser systems face limitations in contrast and brightness.
- Achieving high laser intensity is crucial for exploring fundamental laser-matter interactions.
Purpose of the Study:
- To describe the improved operation of a high-contrast, high-brightness ultraviolet laser system.
- To enhance the performance of excimer laser systems for scientific applications.
Main Methods:
- Modification of a conventional short-pulse dye/excimer laser design.
- Incorporation of three KrF excimer short-pulse amplifiers.
- Implementation of a nonlinear Fourier-filtering stage for contrast enhancement.
Main Results:
- The system produces 100 mJ energy short-pulses with ~700 fs duration.
- Achieved focusability is approximately two times the diffraction limit.
- Demonstrated a focused intensity contrast exceeding 10^12 due to minimal amplified spontaneous emission.
Conclusions:
- The improved laser system provides access to laser-matter interaction experiments at intensities above 10^19 W/cm^2 at 248 nm.
- The nonlinear Fourier-filtering stage significantly boosts laser pulse contrast.
- This advancement enables novel research in high-intensity physics.
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