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Updated: Jan 22, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Nanobridges formed through electron beam image reversal lithography for plasmonic mid-infrared resonators with high
Landobasa Y M Tobing1, Aaron D Mueller1, Jinchao Tong1
1School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Avenue 639798, Singapore.
Abstract:
We present the emergence of nanobridge networks through a nanofabrication technique based on image-reversal electron beam lithography and demonstrate plasmonic structures with high aspect ratio sub-20 nm gaps capable of strong intensity enhancement in the mid-infrared range. The proposed technique, which employs the engineering of natural formations of nanobridges in predefined templates, could serve as an alternative path for realizing mid-infrared plasmonic resonators with potential applications in surface plasmon polariton-based integrated optics, and enhancement of light-matter interaction for high efficiency photodetection and nanoscale light emitters.
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