√7 × √3 surface with a double layer of In on Si(1 1 1) exhibiting both hexagonal and rectangular features
Jeongseok Woo1, Hyungjoon Shim1, Geunseop Lee1
1Department of Physics, Inha University, 100 Inha-ro, Michuhol-gu, Incheon 22212, Republic of Korea.
Abstract:
Using a scanning tunneling microscope (STM), we demonstrate that the In-induced hexagonal (√7 × √3-hex) and rectangular (√7 × √3-rect) √7 × √3 phases on Si(111) are from the same surface with a double layer of In. The double-layer In thickness was derived from observations that a √7 × √3-hex island was formed on the √7 × √3-'striped' phase, which is believed to have a single layer of In atoms. Bias-dependent STM images were obtained from the same √7 × √3 domain and exhibited both √7 × √3-hex and √7 × √3-rect features, which led to the conclusion that both √7 × √3 STM features originate from the same structure. These findings are in stark contrast to the prevailing idea that there are two √7 × √3 surfaces with different structures and In coverage. We also observed a long-range Moiré-like superstructure in the √7 × √3 surface and attribute it to the mismatch of the lattices of the surface layer of In and the Si(1 1 1) substrate.
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