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Single-Mode Tapered Vertical SU-8 Waveguide Fabricated by E-Beam Lithography for Analyte Sensing
Yu Xin1, Gregory Pandraud2, Yongmeng Zhang3
1State Key Laboratory of NBC Protection for Civilian, Beijing 102205, China. xinyu_0619@163.com.
Sensors (Basel, Switzerland)
|August 4, 2019
Summary
This study introduces a novel vertical SU-8 waveguide for enhanced evanescent analyte sensing. The design increases sensitivity by maximizing sensing areas, demonstrating a promising tool for optical sensing applications.
Area of Science:
- Photonics and optical sensing
- Materials science for microfabrication
Background:
- Evanescent wave interaction is crucial for optical sensing.
- Traditional waveguide designs may limit sensing area and sensitivity.
Purpose of the Study:
- To develop a novel vertical SU-8 waveguide for enhanced evanescent analyte sensing.
- To investigate the impact of waveguide dimensions on sensing performance.
- To demonstrate a fabrication method for high-resolution, low-loss waveguides.
Main Methods:
- Numerical simulations to optimize waveguide parameters (height, width).
- Electron-beam (e-beam) lithography for single-step, high-resolution fabrication of vertical SU-8 waveguides.
- Integration of couplers for improved optical coupling and alignment tolerance.
- Optical measurements of transmission loss and absorption sensitivity using saline solutions.
Main Results:
- Fabricated vertical SU-8 waveguides with low transmission loss (1.03 ± 0.19 dB/cm).
- Achieved an absorption sensitivity of 4.8 dB per refractive index unit (dB/RIU).
- E-beam lithography enabled reduced sidewall roughness and scattering loss.
Conclusions:
- The novel vertical SU-8 waveguide design effectively enhances evanescent analyte sensing.
- The fabrication method offers a fast, high-resolution, and low-loss approach.
- The developed waveguide is suitable for practical, plug-and-play optical sensing systems.
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