360 nm Continuous Wave Laser-Based Contact or Non-Contact Laser Interference Nano Lithography

Area of Science:

• Nanotechnology
• Optical Engineering
• Materials Science

Background:

• Laser interference lithography (LIL) is a maskless technique for creating periodic nanostructures over large areas.
• Existing LIL methods require high precision for laser beam alignment, posing a significant challenge.
• The ability to control nano-pattern spacing through parameters like laser intensity and exposure time is crucial.

Purpose of the Study:

• To address the complex beam alignment issues in traditional LIL.
• To develop a simplified and precise method for fabricating nanostructures using LIL.
• To utilize a prism laser interferometer to enhance the LIL process.

Main Methods:

• Employed a prism laser interferometer (both contact and non-contact) to complement the beam alignment in LIL.
• Exposed ma-p1205 PR-coated silicon wafers to a continuous wave (CW) laser at a 360 nm wavelength.
• Utilized rectangular triangular and equilateral triangular prisms (N-BK7) for pattern generation.
• Employed MATLAB and COMSOL for theoretical analysis and comparison with fabricated patterns.

Main Results:

• Successfully fabricated periodic nanostructures with periods of 300 nm and 260 nm.
• Demonstrated the effectiveness of the prism interferometer in simplifying beam alignment for LIL.
• Validated fabricated patterns against theoretical predictions using simulation software.

Conclusions:

• The integration of a prism laser interferometer offers a viable solution to the beam alignment challenges in LIL.
• This enhanced LIL approach facilitates efficient and precise fabrication of nanostructures.
• The method shows promise for scalable and cost-effective production of nano-patterned materials.