Contact Photolithography at Sub-Micrometer Scale Using a Soft Photomask
Chun-Ying Wu1, Heng Hsieh1, Yung-Chun Lee2
1Department of Mechanical Engineering, National Cheng Kung University, Tainan 70101, Taiwan.
Abstract:
This paper proposes a method for improving the patterning resolution of conventional contact photolithography from the micrometer, down to the sub-micrometer scale. The key element is a soft polydimethylsiloxane (PDMS) photomask, which is first replicated from a silicon mold and then patterned with a black photoresist (PR) layer to selectively block ultraviolet (UV) light. This soft PDMS photomask can easily form an intimate and conformable contact with a PR-coated substrate and hence can perform contact photolithography with high pattern resolution. The fabrication processes of this black-PR/PDMS soft photomask are experimentally carried out. Using the fabricated soft photomask, UV patterning by contact photolithography with the smallest line-width of 170 nm over a 4" wafer area was successfully achieved. The advantages and potentials of this new type of contact photolithography will be addressed.
More Related Videos
Related Concept Videos
Contact-dependent Signaling
Gap Junctions
In animal cells, gap junctions are formed...
pH Scale
Contact Angle
The adhesive force is the molecular force between molecules of different materials, that is, between the molecules of the solid and the liquid. The cohesive...
Scaling
Transmission-based Precautions I: Contact, Enteric, and Droplets
Contact Precautions:
Contact precautions are the measures taken to prevent the transmission of infectious agents, especially epidemiologically important microorganisms such as MRSA or influenza, primarily transmitted through direct or indirect contact with an...
Thermometers and Temperature Scales
As many physical properties depend on temperature, the variety of thermometers is...


