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Updated: Jan 20, 2026

Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
Recent advances in plasma modification of 2D transition metal dichalcogenides
Haiyan Nan1, Renwu Zhou2, Xiaofeng Gu1
1Engineering Research Center of IoT Technology Applications (Ministry of CEducation), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, China. xiaosq@jiangnan.edu.cn.
Abstract:
Two-dimensional (2D) transition metal dichalcogenide (TMDC) materials have recently attracted great interest because of their tantalising prospects for a broad range of applications including electronics, optoelectronics, and energy storage. Unlike bulk materials, the device performance of atomically thin 2D materials is determined by the interface, thickness and defects. Plasma processing is very effective for diverse modifications of nanoscale 2D TMDC materials, owing to its uniquely controllable, effective processes and energy efficiency. Herein, we critically discuss selected recent advances in plasma modification of 2D TMDC materials and their optical and electronic (including optoelectronic) properties of relevance to applications in hydrogen production, gas sensing and energy storage devices. Challenges and future research opportunities in the relevant research field are presented. This review contributes to directing future advances of plasma processing of TMDC materials for targeted applications.
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