A parylene coating system specifically designed for producing ultra-thin films for nanoscale device applications

Area of Science:

• Materials Science
• Nanotechnology
• Electrical Engineering

Background:

• Ultrathin parylene films are essential electrical insulators for nanoscale electronic devices.
• Commercial systems often produce thicker films, unsuitable for niche applications like gate insulators in transistors.
• Existing methods lack cost-effective solutions for producing conformal ultrathin parylene coatings.

Purpose of the Study:

• To design and build a custom chemical vapor deposition system for producing ultrathin parylene films (5-100 nm).
• To enable the use of parylene as a gate insulator in transistors and other nanoscale electronic devices.
• To provide a cost-effective and adaptable alternative to commercial coating systems.

Main Methods:

• Custom design and assembly of a parylene chemical vapor deposition system using off-the-shelf vacuum components.
• Incorporation of a small, isolatable deposition chamber, quartz crystal microbalance, and rotating angled stage.
• Development of a removable chamber for transfer to a glovebox for deposition in oxygen/water-free environments.

Main Results:

• Successful production of ultrathin parylene films with thicknesses ranging from 5 to 100 nm.
• Demonstration of enhanced coating conformity using a rotating angled stage.
• Achieved minimal contamination during deposition by enabling transfer to a glovebox.

Conclusions:

• The custom-built system effectively produces ultrathin parylene films for nanoscale electronic applications.
• The design offers a cost-effective, adaptable solution for niche applications not met by commercial systems.
• The ability to deposit in a glovebox ensures pristine surface conditions, critical for device performance.