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Updated: Jan 19, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Computational aberration correction of VIS-NIR multispectral imaging microscopy based on Fourier ptychography
Abstract:
Due to the chromatic dispersion properties inherent in all optical materials, even the best-designed multispectral objective will exhibit residual chromatic aberration. Here, we demonstrate a multispectral microscope with a computational scheme based on the Fourier ptychographic microscopy (FPM) to correct these effects in order to render undistorted, in-focus images. The microscope consists of 4 spectral channels ranging from 405 nm to 1552 nm. After the computational aberration correction, it can achieve isotropic resolution enhancement as verified with the Siemens star sample. We image a flip-chip to show the promise of our system to conduct fault detection on silicon chips. This computational approach provides a cost-efficient strategy for high quality multispectral imaging over a broad spectral range.
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