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Velocity controlled pattern writing: An application of stochastic resonance
1Centre for Research in Nanotechnology and Science, IIT Bombay, Mumbai 400076, Maharashtra, India.
Abstract:
In the present work, the concept of stochastic resonance is employed for pattern fabrication. In particular, the interplay of noise amplitudes and intrinsic system time scales is investigated. This interplay enabled us to obtain preordained patterns. Experiments were performed galvanostatically in a two electrode electrochemical cell onto a n-type Si substrate using a coherent wavelength laser source of 5 mW intensity. A focused laser beam was swept along the silicon substrate unidirectionally by moving the electrochemical cell at different velocities. By systematic tuning of the velocity, we have observed a unimodal variation in the contrast of the pattern. This indicates the occurrence of the stochastic resonance phenomena. Corresponding numerical simulations, performed on a spatial array of diffusively coupled FitzHugh-Nagumo oscillators in the presence of external noise, reveal good agreement with the experimental observations.
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