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Facile fabrication of an F-POSS polymer-based liquid-repellent Cu mesh with excellent durability and self-cleaning
Guanzhou Luo1, Li Wang, Xinying Li
1School of Chemistry and Chemical Engineering, Guangdong Provincial Key Lab of Green Chemical Product Technology, South China University of Technology, Guangzhou 510640, China. phpi@scut.edu.cn xfwen@scut.edu.cn.
Abstract:
A facile method that combines alkali-assisted oxidation and -SH chelation with a click chemistry reaction was employed to create an F-POSS polymer surface (fluorinated octavinyl polyhedral oligomeric silsesquioxane polymer)-based Cu mesh (F-POSS-OM). The as-prepared F-POSS-OM surface displayed a cohering hierarchical nano-F-POSS polymer granule/micro-Cu(OH)2 wire structure, which provided a re-entrant geometry needed for liquid-repellency and low liquid sliding angles (<15°). Moreover, the easy-prepared structure endows the F-POSS-OM with remarkable durability for mechanical and chemical damages, including wear abrasion, tape-peeling, 100 cm-height hammer impact, severe hand twisting, strong acid/base/salt solutions, and high temperatures. Importantly, F-POSS-OM still retained excellent self-cleaning performance even after being subjected to these damages.
