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Updated: Jan 3, 2026

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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Boron vacuum-arc ion source with LaB6 cathode

Vasily Gushenets1, Alexey Bugaev2, Efim Oks1

  • 1Institute of High Current Electronics, Siberian Branch of the Russian Academy of Science, Tomsk 634055, Russia.

The Review of Scientific Instruments
|November 30, 2019
PubMed

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