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Phase and Orientation Control of NiTiO3 Thin Films
Jon Einar Bratvold1, Helmer Fjellvåg1, Ola Nilsen1
1Centre for Materials Science and Nanotechnology (SMN), Department of Chemistry, University of Oslo, P.O. Box 1033 Blindern, N-0315 Oslo, Norway.
Materials (Basel, Switzerland)
|December 29, 2019
Summary
Substrate choice controls nickel titanate (NiTiO3) thin film symmetry and phase. Atomic layer deposition enables creating metastable phases, like the disordered R-3c structure, at lower temperatures.
Area of Science:
- Materials Science
- Solid State Chemistry
- Crystallography
Background:
- Nickel titanate (NiTiO3) exhibits different crystal structures (corundum, ilmenite) based on cation ordering, influencing its properties.
- Controlling NiTiO3 symmetry is crucial for tailoring its physical characteristics, including ferroelectricity.
Purpose of the Study:
- To investigate substrate-controlled synthesis of NiTiO3 thin films using atomic layer deposition (ALD).
- To explore the formation of different NiTiO3 phases and symmetries by varying substrates and annealing conditions.
Main Methods:
- Thin film deposition of NiTiO3 via atomic layer deposition (ALD).
- Utilizing various substrates including α-Al2O3, LaAlO3(100), SrTiO3(100), and MgO(100).
- Employing post-deposition annealing to induce structural ordering.
Main Results:
- ALD enabled deposition of the disordered R-3c phase of NiTiO3 at 250 °C on α-Al2O3 substrates.
- Post-deposition annealing at 650 °C induced the ordered R-3 ilmenite structure.
- Different epitaxial orientations and symmetries were achieved on various oxide substrates.
Conclusions:
- Substrate selection is a key factor in controlling the symmetry and phase of NiTiO3 thin films synthesized by ALD.
- ALD offers a pathway to create metastable NiTiO3 phases, expanding possibilities for materials design.
