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Updated: Dec 31, 2025

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Peng Li1,2, Khairul Alam2, Henri Partanen2
1School of Optics and Photonics, Beijing Institute of Technology, 100081 Beijing, People's Republic of China.
Researchers achieved directional beaming at angles greater than 45° using nanoslits with corrugations. This novel approach enhances directional beaming by utilizing destructive interference, overcoming previous limitations.
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