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Updated: Dec 31, 2025

Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
Published on: May 28, 2016
T J Ruggles1, Y S J Yoo2, B E Dunlap3
1National Institute of Aerospace, Hampton, VA, USA; Sandia National Laboratories, Albuquerque, NM, USA.
This study introduces a novel method to reduce noise in high-resolution electron backscatter diffraction (HREBSD) measurements for crystalline materials. This technique accurately identifies dislocation types and densities, improving material analysis.
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