Selective Atomic Layer Deposition of Metals on Graphene for Transparent Conducting Electrode Application

Although graphene has considerable potential as a next-generation transparent conducting electrode (TCE) material owing to its excellent optical transparency and flexibility, its electrical properties require further improvement for industrial application. This study reports a pathway of doping graphene by selective atomic layer deposition (ALD) of metals to elevate the electrical conductivity of graphene. Introduction of a novel Pt precursor [dimethyl(N,N-dimethyl-3-butene-1-amine-N)platinum(II); C₈H₁₉NPt; DDAP] facilitates a low-temperature (165 °C) process. The sheet resistance (R_s) of graphene is reduced significantly from 471 to 86.8 Ω sq^-1 after 200 cycles of Pt ALD, while the optical transmittance at 550 nm (T) is maintained above 90% up to 200 cycles due to the selective growth of Pt on the defects of graphene. Furthermore, comprehensive analysis, including metal (Ru, Pt, and Ni) ALD on graphene, metal (Ru, Pt, Ni, Au, and Co) evaporation on graphene, and change in the ALD chemicals, demonstrates that ALD allows efficient graphene doping and the oxygen affinity of the metal is one of the key properties for efficient graphene doping. Finally, Pt ALD is applied to a multilayer graphene to further reduce R_s down to 75.8 Ω sq^-1 yet to be highly transparent (T: 87.3%) after 200 cycles. In summary, the selective ALD of metals opens a way of improving the electrical properties of graphene to a level required for the industrial TCE application and has the potential to promote development of other types of functional metal-graphene composites.