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Achieving Macroscopic V4C3T MXene by Selectively Etching Al from V4AlC3 Single Crystals
Dong Wang1,2, Jianguo Si1,2, Shuai Lin1
1Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei 230031, People's Republic of China.
Inorganic Chemistry
|February 19, 2020
Summary
This study details the characterization and properties of V4AlC3 single crystals. Researchers successfully synthesized V4C3Tx MXene using hydrofluoric acid, opening avenues for novel electronic and photonic applications.
Area of Science:
- Materials Science
- Solid State Chemistry
- Nanotechnology
Background:
- MAX phases are a unique class of ternary carbides and nitrides with promising properties.
- V4AlC3 is a less-explored member of the MAX phase family.
- Understanding the fundamental properties of V4AlC3 is crucial for its potential applications.
Purpose of the Study:
- To synthesize and characterize V4AlC3 single crystals.
- To investigate the oxidation behavior and corrosion resistance of V4AlC3.
- To explore the potential for V4AlC3 as a precursor for MXene synthesis.
Main Methods:
- High-temperature flux method for crystal growth.
- X-ray diffraction (XRD), FE-SEM, and EDX for material characterization.
- Thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC) for oxidation studies.
- Raman spectroscopy (RS) for structural analysis.
- Corrosion tests in various acids and alkalis.
Main Results:
- Successfully grew hexagon-like V4AlC3 single crystals.
- Reported the first-order Raman spectra of V4AlC3 experimentally and theoretically.
- Clarified the oxidation mechanism of V4AlC3 between 300 and 1473 K.
- Determined V4AlC3 stability in HCl, H2SO4, and NaOH, but instability in KOH and HNO3.
- Demonstrated the selective etching of Al layers by HF to form V4C3Tx MXene.
Conclusions:
- V4AlC3 single crystals exhibit distinct oxidation and corrosion behaviors.
- Hydrofluoric acid selectively etches Al layers, yielding V4C3Tx MXene.
- This method provides a route to macroscopic MXenes for electronic and photonic applications.

