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Related Concept Videos

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Related Experiment Video

Updated: Dec 25, 2025

Digital Inline Holographic Microscopy DIHM of Weakly-scattering Subjects
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Stitching sub-aperture in digital holography based on machine learning.

Feng Pan, Bin Dong, Wen Xiao

    Optics Express
    |April 1, 2020
    PubMed
    Summary
    This summary is machine-generated.

    Machine learning simplifies sub-aperture stitching in digital holography (DH). This novel approach improves spatial resolution and measurement accuracy for complex optical surfaces, making optical metrology more reliable.

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    Area of Science:

    • Optical Metrology
    • Digital Holography
    • Machine Learning Applications

    Background:

    • Sub-aperture stitching in digital holography (DH) is crucial for enhancing spatial resolution and measuring large optical surfaces.
    • Current stitching methods can be complex and cumbersome, especially for intricate geometries.

    Purpose of the Study:

    • To introduce a novel machine learning-based approach for sub-aperture stitching in digital holography.
    • To demonstrate the potential of machine learning in simplifying and improving the accuracy of optical metrology processes.

    Main Methods:

    • A machine learning network was constructed based on the computational model of sub-aperture stitching.
    • The network was trained using an array of phase-map sub-apertures from an off-axis digital holographic system.
    • Alignment errors and system aberrations in sub-aperture maps were corrected through network training.

    Main Results:

    • The proposed machine learning approach successfully corrected alignment errors and system aberrations.
    • Accurate measurement of hemisphere surface topography was achieved, validating the method.
    • The study demonstrated the effectiveness of machine learning in sub-aperture stitching.

    Conclusions:

    • Machine learning offers a powerful tool to simplify complex sub-aperture stitching processes in digital holography.
    • The developed approach enhances the reliability and accuracy of optical metrology for large and complex optical surfaces.