Pattern randomization: an efficient way to design high-performance metallic meshes with uniform stray light for EMI...

Area of Science:

• Optics and Photonics
• Materials Science
• Nanotechnology

Background:

• Metallic meshes are crucial for applications requiring light transmission and electromagnetic shielding.
• Uniform stray light distribution is essential for advanced optical systems.
• Existing grid designs often suffer from non-uniform diffraction patterns.

Purpose of the Study:

• To introduce a novel grid pattern design method, pattern randomization, for metallic meshes.
• To achieve uniform stray light distribution in metallic meshes.
• To maintain high visible light transmittance and electromagnetic shielding efficiency.

Main Methods:

• Developed a pattern randomization technique to weaken grid periodicity.
• Analyzed diffraction patterns of periodic, aperiodic, and concentric ring structures.
• Designed a two-dimensional grid using pattern randomization, ensuring connectivity.
• Simulated and experimentally verified the performance of the designed metallic mesh.

Main Results:

• Pattern randomization effectively weakens grid periodicity, leading to uniform stray light.
• Achieved "radial homogenization" and "angular homogenization" of diffracted energy.
• Metallic mesh with (90%, 90%) randomness showed uniform stray light, >94% visible light transmittance, and ~17.3 dB shielding efficiency in the Ku-band.
• Reduced stray light coefficient (Cv) from 1078.14% to 164.65%.

Conclusions:

• Pattern randomization is an effective method for designing metallic meshes with uniform stray light.
• The designed metallic mesh balances optical uniformity with essential functional properties like transmittance and shielding.
• This technique offers a pathway for developing advanced optical components and protective materials.