Rapid and Selective NH3 Sensing by Porous CuBr
Andreas T Güntner1, Markus Wied1, Nicolay J Pineau1
1Particle Technology Laboratory Department of Mechanical and Process Engineering ETH Zurich Sonneggstrasse 3 Zurich 8092 Switzerland.
Advanced Science (Weinheim, Baden-Wurttemberg, Germany)
|April 11, 2020
Summary
This study presents a novel, low-power sensor for detecting ammonia (NH3) at parts-per-billion levels. The nanostructured porous copper bromide (CuBr) films offer enhanced sensitivity and rapid response times for accurate gas detection.
Area of Science:
- Materials Science
- Chemical Sensors
- Nanotechnology
Background:
- Developing sensitive and selective gas sensors for ammonia (NH3) at low concentrations (parts-per-billion) is crucial for environmental monitoring and safety.
- Existing sensors often require high power consumption and heating, limiting their application in portable devices.
Purpose of the Study:
- To develop a room-temperature, solid-state sensor for fast and selective detection of NH3 at ppb levels.
- To investigate the performance of nanostructured porous copper bromide (CuBr) films for NH3 sensing.
Main Methods:
- Fabrication of nanostructured porous CuBr films using flame-aerosol deposition of CuO followed by dry reduction and bromination.
- In situ monitoring of film resistance during fabrication for process control.
- Evaluation of NH3 sensitivity, response time, and selectivity against common interfering gases at various humidity levels.
Main Results:
- Porous CuBr films exhibited an order of magnitude higher NH3 sensitivity and five times faster response times compared to denser films.
- Rapid detection (2.2 min) of NH3 down to 5 ppb was achieved, even at 90% relative humidity.
- Outstanding selectivity (30-260) was demonstrated against common confounders like ethanol, acetone, and CO.
Conclusions:
- The developed room-temperature, solid-state CuBr sensor offers superior performance for NH3 detection, suitable for low-power, portable applications.
- The fabrication process using flame-aerosol technology provides excellent control and opens possibilities for other semiconductor materials.

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