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Fiber Lithography: A Facile Lithography Platform Based on Electromagnetic Phase Modulation Using a Highly
Jonghyun Kim1, Dongwoon Shin1, Jiyoung Chang1
1Department of Mechanical Engineering, University of Utah, Salt Lake City, Utah 84112, United States.
ACS Applied Materials & Interfaces
|April 17, 2020
Summary
This study introduces a novel, affordable lithography technique using birefringent polymer fibers to pattern ultraviolet light. This method enables precise, direct-writing capabilities for advanced manufacturing and semiconductor applications.
Area of Science:
- Materials Science
- Optics
- Nanotechnology
Background:
- Current lithography methods are expensive and require specialized facilities.
- There is a need for accessible and scalable patterning solutions.
Purpose of the Study:
- To develop a novel, cost-effective lithography method using electromagnetic phase modulation.
- To overcome the limitations of existing high-cost lithography techniques.
Main Methods:
- Utilized a highly birefringent electrospun fiber made of poly(ethylene oxide) (PEO)-poly(ethylene glycol) (PEG).
- Employed near-field electrospinning to pattern the polymeric microfibers.
- Combined optical birefringent effect with programmable fiber patterns and a polarizer setup for UV light manipulation.
Main Results:
- Achieved precise photoresist patterning following the fiber shape, enabling zero- to two-dimensional features.
- Demonstrated facile optical alignments without dedicated marks.
- Successfully created various micro- to macroscale patterns (serpentine, tree, antenna circuits) on flexible substrates.
Conclusions:
- The presented table-top scale approach offers a practical and affordable lithography solution.
- Leverages direct-writing, tunable polymer optical functionality, scalability, and simple alignment.
- Expected to advance manufacturing and semiconductor industries with accessible patterning technology.
