Development of a symmetrical micro-beam minimizing horizontal drift for indentation and scratch

In this work, a symmetric micro-beam was developed to eliminate horizontal drift of the tip during indent and scratch processes, which was inevitable in the usage of a traditionally one-end-fixed cantilever. Using the finite element simulation, a database involving the maximum stress and spring constant depending on the size parameters (length and inertial moment) of the symmetric beam was established to help in optimizing the beam design. A real symmetric micro-beam was fabricated based on the database, and the loading accuracy was checked through the calibration of the spring constant. The reliability of the symmetric beam was experimentally verified through the fabrication of the micro-channel and micro-dot, showing that the horizontal drift was completely suppressed. This technology can potentially be applied in micro/nanoscale research and manufacturing to increase the accuracy of detection and processing, such as the applications in probe-based lithography to improve the loading accuracy at high load condition and enhance the stability of the beam system at high sliding speed.