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Direct Color Printing with an Electron Beam.

Soroosh Daqiqeh Rezaei1,2,3, Jinfa Ho1, Tao Wang1,4

  • 1Nanofabrication Department, Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, 138634 Singapore.

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|May 12, 2020
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Summary

Direct electron-beam printing creates color patterns by altering Fabry-Perot cavity heights on a nickel-coated polymer film. This novel method achieves high resolution and enables precise 2.5D nanostructure fabrication.

Keywords:
2.5D nanostructurescolor printingdirect-write nanofabricationelectron-beam lithographyoptical grating

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Area of Science:

  • Nanotechnology
  • Materials Science
  • Optics

Background:

  • Direct patterning methods are crucial for fabricating nanoscale devices.
  • Existing techniques like direct laser writing often require prepatterned substrates.
  • Controlling nanostructure height is key for optical applications.

Purpose of the Study:

  • To demonstrate a direct electron-beam printing method for color patterning.
  • To investigate the fabrication of Fabry-Perot cavities with tunable heights.
  • To explore the potential for creating 2.5D nanostructures.

Main Methods:

  • Utilizing a focused electron beam to pattern a poly(methyl methacrylate) film coated with nickel.
  • Creating variations in Fabry-Perot cavity height through electron bombardment.
  • Analyzing color image data for height measurements and point exposure function determination.

Main Results:

  • Achieved direct color printing without prepatterned substrates.
  • Demonstrated resolution defined by the electron beam's properties.
  • Measured cavity heights with approximately 5 nm accuracy.
  • Introduced a reflectance-based method for electron beam characterization.
  • Fabricated blazed gratings and showed potential for other 2.5D nanostructures.

Conclusions:

  • Direct electron-beam writing offers a versatile approach for high-resolution color printing.
  • The technique allows for precise control over nanostructure topography.
  • This method facilitates advanced applications in optics and nanolithography.