Single-Step Formation of a Low Work Function Cathode Interlayer and n-type Bulk Doping from Semiconducting

Keli Fabiana Seidel1,2, Dominique Lungwitz2, Andreas Opitz2

  • 1Physics Department, Universidade Tecnológica Federal do Paraná, 80230-901 Curitiba, Brazil.

Summary

Polyethylenimine (PEI) interlayers significantly reduce organic electronic device resistance by forming at interfaces and slightly doping the semiconductor. This one-step process impacts both bulk and interfacial properties.

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