Simultaneous removal of SO₂, NO and Hg⁰ using an enhanced gas phase UV-AOP method

The core for simultaneous removal of SO₂, NO and Hg⁰ is the oxidation of NO and Hg⁰. Radical induced oxidation of NO and Hg⁰ is considered to be the most efficient method. We develop a novel gas phase advanced oxidation process (AOP) of UV-Heat/H₂O₂-NaClO₂ to simultaneously remove SO₂, NO and Hg⁰ due to a great synergism between H₂O₂ and NaClO₂ under thermal and ultraviolet (UV) co-catalysis. The results indicated that the SO₂ removal was always good, while the removal of NO and Hg⁰ was affected by NaClO₂ and UV. Higher catalytic temperature and longer flue gas residence time favored the removal of NO and Hg⁰. The presence of SO₂ and NO facilitated Hg⁰ removal. Kinetics analyses were conducted to provide the reaction rate of removal of NO and Hg⁰ under different conditions. X-ray photoelectron spectroscopy (XPS) revealed the product composition as Cl^-, Hg²⁺, NO₃^- and SO₄^2-. Electron spin resonance (ESR) tests confirmed the generation of HO. Cost analyses demonstrated the better cost performance of the proposed method compared to SCR-ACI combined method. HO and ClO₂ were proved to be the main oxidant. The reaction mechanism for removal of NO and Hg⁰ by using UV-Heat/H₂O₂-NaClO₂ were proposed finally.