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Updated: Dec 15, 2025

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Insulators for 2D nanoelectronics: the gap to bridge
Yury Yu Illarionov1,2, Theresia Knobloch3, Markus Jech3
1Institute for Microelectronics (TU Wien), Gusshausstrasse 27-29, 1040, Vienna, Austria. illarionov@iue.tuwien.ac.at.
Abstract:
Nanoelectronic devices based on 2D materials are far from delivering their full theoretical performance potential due to the lack of scalable insulators. Amorphous oxides that work well in silicon technology have ill-defined interfaces with 2D materials and numerous defects, while 2D hexagonal boron nitride does not meet required dielectric specifications. The list of suitable alternative insulators is currently very limited. Thus, a radically different mindset with respect to suitable insulators for 2D technologies may be required. We review possible solution scenarios like the creation of clean interfaces, production of native oxides from 2D semiconductors and more intensive studies on crystalline insulators.
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