Rapid large-scale fabrication of multipart unit cell metasurfaces

Periodic diffractive elements known as metasurfaces constitute platform technology whereby exceptional optical properties, not attainable by conventional means, are attained. Generally, with increasing unit-cell complexity, there emerges a wider design space and bolstered functional capability. Advanced devices deploying elaborate unit cells are typically generated by electron-beam patterning which is a tedious, slow process not suitable for large surfaces and quick turnaround. Ameliorating this condition, we present a novel route towards facile fabrication of complex periodic metasurfaces based on sequential exposures by laser interference lithography. Our method is fast, cost-effective, and can be applied to large surface areas. It is enabled by precise control over periodicity and exposure energy. With it we have successfully patterned and fabricated one-dimensional (1D) and two-dimensional (2D) multipart unit cell devices as demonstrated here. Thus, zero-order transmission spectra of an etched four-part 1D grating device are simulated and measured for both transverse-electric (TE) and transverse-magnetic (TM) polarization states of normally incident light. We confirm non-resonant wideband antireflection (∼800 nm) for TM-polarized light and resonance response for TE-polarized light in the near-IR band spanning 1400-2200 nm in a ∼100 mm² device. Furthermore, it is shown that this method of fabrication can be implemented not only to pattern periodic symmetric/asymmetric designs but also to realize non-periodic metasurfaces. The method will be useful in production of large-area photonic devices in the realm of nanophotonics and microphotonics.