Electrically curable double-layer polymer resist for dynamic nanoscale lithography

A double-layer polymer resist composed of a top electrically curable resin layer with onium salt photo-acid generators and a bottom ionic conductive polymer transfer layer has been developed for dynamic nanoscale electric lithography. By applying an electric potential on the resist from conductive patterns on a mask, the acid generators under the conductive patterns are electrolyzed into proton acid, which consequently cross-links the cationically polymerizable resin resist. With the double-layer resist, nanopatterns can be generated with a sub-50 nm resolution. By applying different electric potentials on the individual conductive patterns on the mask, the transferred nanopatterns can be modified dynamically.