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A base-repair based electrochemiluminescent genotoxicity sensor that detects abasic sites in double-stranded DNA
Dong-Mei Wang1, Jia Jia1, Rong-Fu Huang1
1College of Materials and Chemistry & Chemical Engineering, Chengdu University of Technology, Chengdu 610059, China. huangrongfu13@cdut.cn.
Abstract:
A novel genotoxicity sensor was developed based on the base repair process associated with the electrochemiluminescence (ECL) detection of abasic sites in a double-stranded DNA monolayer. This is the first time that an ECL sensor with the ability to identify the removed nucleobases in a DNA duplex has been studied. The successful detection of abasic sites created by DNA glycosylase indicates its further applications for examining some other specific types of DNA damage.

