Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

Biasing of FET01:22

Biasing of FET

549
Biasing a Junction Field Effect Transistor (JFET) is crucial for setting operational parameters and ensuring efficient functioning in electronic circuits. JFETs are characterized by using a single carrier type in N-channel or P-channel configurations, where the channel is surrounded by PN junctions. These junctions are central to the device's ability to control current flow.
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
549
Field Effect Transistor01:29

Field Effect Transistor

915
Field-effect transistors (FETs) are integral to electronic circuits and distinguished by their three-terminal setup: the gate, drain, and source. These transistors operate as unipolar devices, which utilize either electrons or holes as charge carriers, in contrast to bipolar transistors, which use both types of carriers. The primary function of the FET is to modulate the flow of these carriers from the source to the drain through a channel. The voltage difference between the gate and source...
915
MOSFET: Enhancement Mode01:22

MOSFET: Enhancement Mode

662
Enhancement-mode MOSFETs are pivotal components in electronics, distinguished by their capacity to act as highly efficient switches. They are part of the larger family of metal-oxide Semiconductor Field-Effect Transistors (MOSFETs). They are available in two types: p-channel and n-channel, each tailored to specific polarity operations.
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
662
MOSFET Amplifiers01:17

MOSFET Amplifiers

368
The MOSFET, when operating in its active region, functions as a voltage-controlled current source. In this region, the gate-to-source voltage controls the drain current. This principle underlies the operation of the transconductance MOSFET amplifier. The output current is directed through a load resistor to convert this amplifier into a voltage amplifier. The output voltage is then obtained by subtracting the voltage drop across the load resistance from the supply voltage. This process results...
368
MOSFET01:16

MOSFET

916
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) plays a pivotal role in modern electronics thanks to its versatility and efficiency in controlling electrical currents. This device, also known as IGFET, MISFET, and MOSFET, has three main terminals: the Source, Drain, and Gate. MOSFETs are classified into n-channel or p-channel types based on the doping characteristics of their substrate and the source or drain regions.
In an n-MOSFET, the structure includes n-type source and drain...
916
Biasing of Metal-Semiconductor Junctions01:27

Biasing of Metal-Semiconductor Junctions

455
Biasing metal-semiconductor junctions involves applying a voltage across the junction. Specifically, the metal is connected to a voltage source, while the semiconductor is grounded. This technique is essential for controlling the direction and magnitude of current flow in electronic devices, including diodes, transistors, and photovoltaic cells.
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
455

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Gigahertz Cutoff Frequencies and High Gain in Graphene-Based Hot-Electron Transistor Enabled by Material Engineering.

ACS applied materials & interfaces·2026
Same author

Technology Roadmap of Bioinspired Computing Hardware.

ACS nano·2026
Same author

Junctionless Silicon Nanowire Transistors without the Use of Impurity Doping.

ACS nano·2026
Same author

Controlling the Wake-Up Mechanism and Switching Kinetics of Ferroelectric Hf<sub><i>x</i></sub>Zr<sub>1 - <i>x</i></sub>O<sub>2</sub> through Hf Content Modulation.

ACS applied materials & interfaces·2025
Same author

Peak Splitting and Bias Fields in Ferroelectric Hafnia Mediated by Interface Charge Effects.

ACS applied materials & interfaces·2025
Same author

Effect of HZO Thickness Scaling in the Bilayer Ferroelectric Tunnel Junction.

ACS applied electronic materials·2025

Related Experiment Video

Updated: Dec 8, 2025

Chemical Synthesis of Porous Barium Titanate Thin Film and Thermal Stabilization of Ferroelectric Phase by Porosity-Induced Strain
08:00

Chemical Synthesis of Porous Barium Titanate Thin Film and Thermal Stabilization of Ferroelectric Phase by Porosity-Induced Strain

Published on: March 27, 2018

11.4K

Frequency Mixing with HfO2-Based Ferroelectric Transistors.

Halid Mulaosmanovic1, Stefan Dünkel2, Martin Trentzsch2

  • 1NaMLab gGmbH, 01187 Dresden, Germany.

ACS Applied Materials & Interfaces
|September 17, 2020
PubMed
Summary

Ferroelectric hafnium oxide field-effect transistors (FeFETs) achieve high-efficiency second harmonic generation and frequency mixing. Tuning material properties enhances performance, enabling electrical control over spectral components for radiofrequency applications.

Keywords:
ferroelectric field-effect transistor (FeFET)ferroelectric hafnium oxidefrequency mixingradiofrequencysecond harmonic generation

More Related Videos

A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
10:40

A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy

Published on: April 8, 2018

8.5K
In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
09:49

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx

Published on: May 13, 2020

4.3K

Related Experiment Videos

Last Updated: Dec 8, 2025

Chemical Synthesis of Porous Barium Titanate Thin Film and Thermal Stabilization of Ferroelectric Phase by Porosity-Induced Strain
08:00

Chemical Synthesis of Porous Barium Titanate Thin Film and Thermal Stabilization of Ferroelectric Phase by Porosity-Induced Strain

Published on: March 27, 2018

11.4K
A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
10:40

A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy

Published on: April 8, 2018

8.5K
In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
09:49

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx

Published on: May 13, 2020

4.3K

Area of Science:

  • Radiofrequency electronics
  • Solid-state physics
  • Materials science

Background:

  • Second harmonic generation (SHG) and frequency mixing are crucial for radiofrequency (RF) applications.
  • Ferroelectric field-effect transistors (FeFETs) utilizing hafnium oxide (HfO2) exhibit symmetric transfer curves, showing potential for SHG.
  • Optimizing FeFETs for RF signal processing requires understanding the influence of material properties on device performance.

Purpose of the Study:

  • To investigate the impact of ferroelectric layer thickness and silicon substrate doping on FeFET symmetry and SHG performance.
  • To demonstrate frequency mixing (sum and difference generation) using a single FeFET.
  • To explore the electrical control of spectral components in RF signals via ferroelectric switching.

Main Methods:

  • Fabrication of FeFETs with varying HfO2 thickness and silicon doping levels.
  • Characterization of device symmetry and second harmonic generation (SHG) efficiency.
  • Experimental demonstration of sum and difference frequency generation using the FeFETs.

Main Results:

  • FeFET symmetry was found to be highly sensitive to ferroelectric thickness and substrate doping.
  • SHG conversion gain and spectral purity were significantly improved (up to 96%) through precise tuning.
  • Single FeFETs successfully generated both sum and difference frequencies, attributed to strong quadratic nonlinearities.

Conclusions:

  • HfO2-based FeFETs offer a promising platform for efficient SHG and frequency mixing in RF applications.
  • Precise control over material properties and ferroelectric switching enables enhanced device performance.
  • This work paves the way for novel, electrically controlled frequency manipulation using simple ferroelectric devices.