Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin

Area of Science:

• Materials Science
• Nanotechnology
• Surface Science

Background:

• Mass production of nanostructures via ultraviolet nanoimprint lithography (UV-NIL) demands highly durable molds.
• Evaluating mold durability is crucial for reliable nanostructure fabrication.

Purpose of the Study:

• To assess the durability of line-patterned replica molds made from high-hardness UV-curable resin.
• To investigate the anisotropic contact angle behavior of molds during repetitive nanoimprint lithography.
• To establish a method for predicting mold lifetime and preventing defects.

Main Methods:

• Repetitive transfer experiments were conducted on line-patterned replica molds.
• Contact angle measurements were performed along and across the line patterns.
• Anisotropic contact angle characteristics were analyzed in relation to mold wear.

Main Results:

• Contact angle along line patterns decreased significantly with transfers before stabilizing.
• Contact angle across line patterns decreased slowly, maintaining a higher value than along the pattern.
• Mold failure was correlated with the convergence of contact angles along and across the patterns.
• A linear decrease in contact angle from approximately 90° was observed across the pattern.

Conclusions:

• The anisotropic contact angle behavior of UV-NIL molds can predict their service life.
• Monitoring contact angle changes allows for timely replacement of molds, preventing pattern defects.
• This predictive capability can significantly reduce durability evaluation time for mass production.