Related Experiment Video
Updated: Dec 3, 2025

Effect of Bending on the Electrical Characteristics of Flexible Organic Single Crystal-based Field-effect Transistors
Published on: November 7, 2016
Effect of Curie Temperature on Ferroelectric Tunnel FET and Its RF/Analog Performance
Abstract:
In this article, a numerical simulation study for the ferroelectric gate oxide tunnel field-effect transistor (Ferro-TFET) has been presented. The performance of the device is analyzed following Landau's theory and its behavior in the temperature range of 200-300 K. A minimum subthreshold swing and maximum transconductance is obtained around the Curie temperature ( TC ) of 580 ± 10 K for the simulated device. The simulation result is supported by the simple analytical model. The temperature sensitivity analysis is studied on different analog and RF figure of merits for Ferro-TFET. In this study, the Ferro-TFET shows the remarkable result in reducing the detrimental effect of mobility degradation at high gate voltage and performance degradation at high temperatures as compared to conventional TFETs and MOSFET. Therefore, at Curie temperature, the operation of the Ferro-TFET shows the remarkable results for analog and RF applications.
More Related Videos
Related Concept Videos
Field Effect Transistor
Biasing of FET
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
Ferromagnetism
Fermi Level
At absolute zero temperature, electrons fill all energy states up to the Fermi level, leaving upper states empty. As the temperature rises,...
Characteristics of JFET
The core of a JFET's operation is controlling drain current by modulating the gate-source voltage. When the drain and gate voltage are set to zero, the JFET exhibits no net current flow, representing a state of equilibrium. The drain current increases linearly as the...
Fermi Level Dynamics
Electron affinity in semiconductors refers to the energy gap between the minimum of its conduction band and the vacuum level and it is a critical parameter in determining how easily a semiconductor can accept additional electrons.
The work...

