Rational design of the carbon doping of hexagonal boron nitride for oxygen activation and oxidative desulfurization
Hongping Li1, Wendi Fu, Jie Yin
1Institute for Energy Research, School of Chemistry and Chemical Engineering, Jiangsu University, Zhenjiang, 212013, P. R. China. zhuws@ujs.edu.cn.
Abstract:
The doping of hexagonal boron nitride (h-BN) materials has a great influence on their catalytic oxidation performance, but the mechanism of doping has still not been studied in depth to date. Herein, carbon-doped h-BN materials were systematically investigated. Three different doping modes were established, and their performance for O2 activation and oxidative desulfurization (ODS) were explored. DFT calculation showed that not all carbon-doped forms of the h-BN surface could activate O2. Specifically, two of the dispersed doping forms could activate O2, whereas the π-doping form could not activate O2, and thus the ODS reaction could not be carried out. For the two dispersed doping forms, the O2 adsorption on the CB-doped h-BN surface (C-doped in B position) was too strong, which hampered its ODS performance; whereas the O2 adsorption on the CN-doped h-BN surface (C-doped in the N position) was moderate, resulting in good catalytic activity for ODS. Therefore, to design effective BN-based catalysts by C doping, it is suggested that the C dopant should be dispersed to substitute the N atom of h-BN, and CN-doped h-BN will play an important role in ODS with moderate O2 activation. This study can be used as a reference for the catalytic oxidation of boron nitride.
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