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Towards Volatile Organoselenium Compounds with Cost-Effective Synthesis
Jaroslav Charvot1, Daniel Pokorný1, Milan Klikar1
1Institute of Organic Chemistry and Technology, Faculty of Chemical Technology, University of Pardubice, Studentská 573, 53210 Pardubice, Czech Republic.
Researchers developed new, cost-effective organoselenium compounds for atomic layer deposition. These novel precursors offer improved synthesis and thermal stability for advanced material applications.
Area of Science:
- Materials Science
- Inorganic Chemistry
- Chemical Engineering
Background:
- The limited availability of volatile organoselenium precursors hinders advancements in atomic layer deposition (ALD).
- Developing new, stable, and easily synthesized selenium precursors is crucial for ALD applications.
Purpose of the Study:
- To report the facile and cost-effective preparation of novel organoselenium compounds.
- To expand the portfolio of volatile precursors for atomic layer deposition.
- To optimize synthesis for industrial scalability and reduced cost.
Main Methods:
- Optimized synthesis of bis(trialkylstannyl)selenides, selenole, and bis(trialkylsilyl)selenides.
- Utilized readily available starting materials and simple heating in a pressure vessel.
- Characterization via multinuclear NMR and GC/MS; thermal properties analyzed by DSC and TGA.
Main Results:
- Successfully synthesized six new organoselenium compounds: two bis(trialkylstannyl)selenides, one selenole, and three bis(trialkylsilyl)selenides.
- Optimized synthetic routes minimize additives, catalysts, and purification steps.
- Compounds exhibit thermal stability ranging from 160-300 °C, suitable for ALD processes.
Conclusions:
- The developed organoselenium compounds are promising volatile precursors for atomic layer deposition.
- The cost-effective and scalable synthesis offers a viable alternative to existing precursors.
- These compounds can facilitate the deposition of selenium-containing thin films.
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