The effect of deposition times in DC-magnetron sputtering on micromorphology of TiO₂ thin films

TiO₂ thin films have been prepared by DC-magnetron sputtering process with various deposition times (8, 14, 16, and 20 min) and the micromorphology of their surface has been investigated by means of multifractal analysis. As the main purpose of the manuscript, the topography of all samples are examined by atomic force microscopy (AFM) through the Mountains Map® Premium software which characterizes motifs of significant peaks and pits through stereometric data by the watershed segmentation algorithm. In addition, multifractal features of samples provide deeper insight into texture characteristics and used as the supplementary of the results.