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Imaging error compensation method for through-focus scanning optical microscopy images based on deep learning.

Yufu Qu1, Jiajun Ren2, Renju Peng2

  • 1Key Laboratory of Precision Opto-Mechatronics, Technology of Education Ministry, School of Instrumentation and Opto-Electronic Engineering, Beihang University, Beijing, China.

Journal of Microscopy
|April 2, 2021
PubMed
Summary
This summary is machine-generated.

This study introduces a deep learning method using U-Net to reduce noise in through-focus scanning optical microscopy (TSOM) images. The technique enhances nanoscale linewidth estimation accuracy by compensating for imaging errors.

Keywords:
TSOMU-Netdeep learningimaging error compensation

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Area of Science:

  • Optics
  • Metrology
  • Machine Learning

Background:

  • Through-focus scanning optical microscopy (TSOM) is a nanoscale metrology technique combining microscopy and simulations.
  • TSOM image quality can be compromised by mechanical vibrations and optical noise, impacting measurement accuracy.

Purpose of the Study:

  • To develop and validate a deep learning-based method for compensating imaging errors in TSOM images.
  • To improve the accuracy of nanoscale linewidth estimation using optimized TSOM images.

Main Methods:

  • A deep learning approach utilizing the U-Net architecture was employed for image error compensation.
  • The U-Net was trained using a supervised learning strategy, with simulated TSOM images serving as the ground truth.
  • The network minimizes the difference between experimental and simulated images by iteratively updating weights and biases.

Main Results:

  • The proposed U-Net based method effectively compensates for imaging errors in TSOM images.
  • Optimized TSOM images derived from the compensation method show significantly enhanced accuracy for nanoscale linewidth estimation.

Conclusions:

  • Deep learning with U-Net offers a robust solution for improving TSOM image quality and measurement accuracy.
  • The developed compensation method demonstrates significant potential for advancing nanoscale metrology applications.