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Zhi Chen¹, Rui Wang¹, Tao Ma²

¹Division of Nanomaterials & Chemistry, Hefei National Laboratory for Physical Sciences at the Microscale, Institute of Energy, Hefei Comprehensive National Science Center, CAS Center for Excellence in Nanoscience, Institute of Biomimetic Materials & Chemistry, Anhui Engineering Laboratory of Biomimetic Materials, Department of Chemistry, University of Science and Technology of China, Hefei, 230026, China.

Angewandte Chemie (International Ed. in English)

|April 15, 2021

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Researchers developed a spray-coating method to create continuous metal-organic framework (MOF) films. This technique enables large-scale, cost-effective production of uniform MOF thin films on various substrates.

Area of Science:

Materials Science
Nanotechnology
Chemical Engineering

Background:

Metal-organic frameworks (MOFs) offer tunable properties for diverse applications.
Scalable fabrication of high-quality MOF films remains a challenge.
Existing methods often lack uniformity, cost-effectiveness, or substrate compatibility.

Purpose of the Study:

To develop a facile, fast, and cost-effective method for large-scale MOF film deposition.
To achieve controlled thickness and high uniformity in MOF films.
To explore the deposition of MOF films on a wide range of substrates.

Main Methods:

Development of perfectly dispersed colloidal solutions of amorphous MOF nanoparticles.
Utilizing spray-coating technique for film deposition.

Keywords:

ZIF-67 crystallization metal-organic frameworks thin films

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Low-temperature in situ heating for conversion to crystalline MOF films.

Main Results:

Continuous MOF films with controlled thickness (44–5100 nm) deposited over >80 cm length scales.
Uniform and compact MOF films fabricated on diverse substrates including FTO, glass, SiO2, Al2O3, Si, Cu, and flexible polycarbonate.
Demonstrated successful fabrication of cobalt-(2-methylimidazole)2 and zinc-(2-methylimidazole)2 films.

Conclusions:

The spray-coating method provides a scalable route for producing high-quality MOF thin films.
The colloidal precursor approach is key to achieving uniform and defect-free films.
This technique holds significant potential for the large-scale manufacturing of various MOF films for technological applications.