Uniform Depth Channel Flow: Problem Solving
Uniform Depth Channel Flow
Reducing Line Loss
Migration
Boundary Conditions: Lossless Lines
Cell Migration
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Updated: Nov 9, 2025

Study of Cell Migration in Microfabricated Channels
Published on: February 21, 2014
Chulmin Kim1, Moonsoo Sung1, Soo Yeon Kim2
1School of Electrical Engineering, Korea University, 145 Anam-ro, Seongbuk-gu, Seoul 02841, Republic of Korea.
Conducting channels in 2D multilayer ReS2 normally migrate to the top surface. However, after voltage stress, new oxide traps restrict this migration, impacting carrier mobility and device performance.
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