Related Experiment Video
Updated: Nov 8, 2025

10:40
A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
Published on: April 8, 2018
8.4K
Comprehensive Non-volatile Photo-programming Transistor Memory via a Dual-Functional Perovskite-Based Floating Gate.
Wei-Chen Yang1,2, Yan-Cheng Lin1,2, Ming-Yun Liao1
1Department of Chemical Engineering, National Taiwan University, Taipei 10617, Taiwan.
ACS Applied Materials & Interfaces
|April 22, 2021
Summary
Researchers developed a novel photonic transistor memory for light fidelity (Li-Fi) applications. This device enables fully optical data writing and erasing using complementary light absorption, enhancing efficiency and reducing power consumption.
Area of Science:
- Optoelectronics
- Materials Science
Background:
- Photonic transistor memory is crucial for next-generation light fidelity (Li-Fi) applications, offering high speed, security, and low power.
- Current devices often require electrical bias, limiting data transmission efficiency and energy consumption.
Purpose of the Study:
- To develop a novel photonic transistor memory with fully optical "photo-writing" and "photo-erasing" capabilities.
- To overcome the limitations of electrical bias in existing photonic memory devices.
Main Methods:
- Utilized complementary light absorption between n-type BPE-PTCDI and CH3NH3PbBr3/poly(2-vinylpyridine) hybrid floating gate for dual optical manipulation.
- Fabricated a two-terminal flexible photonic memory by removing the rigid gate electrode.
Main Results:
- Achieved full-spectrum operation with stable photo-writing (PW)-reading (R)-photo-erasing (PE)-reading (R) cycles.
- Demonstrated a high memory ratio of ~10^4 and long-term retention exceeding 10^4 s.
- Showcased stable electrical performance after 1000 bending cycles and multilevel functionality in the flexible device.
Conclusions:
- The novel photonic transistor memory offers fully optical functionality, enabling efficient and low-power operation for Li-Fi.
- The flexible, two-terminal device exhibits robust performance and multilevel behavior, indicating significant potential for future photoactive electronic devices.
Related Concept Videos
MOS Capacitor
1.2K
A Metal-Oxide-Semiconductor (MOS) capacitor is a fundamental structure used extensively in semiconductor device technology, particularly in the fabrication of integrated circuits and MOSFETs (metal-oxide-semiconductor field-effect transistors). The MOS capacitor consists of three layers: a metal gate, a dielectric oxide, and a semiconductor substrate.
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
1.2K
MOSFET
748
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) plays a pivotal role in modern electronics thanks to its versatility and efficiency in controlling electrical currents. This device, also known as IGFET, MISFET, and MOSFET, has three main terminals: the Source, Drain, and Gate. MOSFETs are classified into n-channel or p-channel types based on the doping characteristics of their substrate and the source or drain regions.
In an n-MOSFET, the structure includes n-type source and drain...
In an n-MOSFET, the structure includes n-type source and drain...
748

