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Exfoliation and Analysis of Large-area, Air-Sensitive Two-Dimensional Materials
Published on: January 5, 2019
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Large-scale growth of few-layer two-dimensional black phosphorus
Zehan Wu1,2, Yongxin Lyu1,2, Yi Zhang1
1Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong, People's Republic of China.
Nature Materials
|May 11, 2021
Summary
Researchers developed large-scale, ultrathin black phosphorus (BP) using pulsed laser deposition. This breakthrough enables wafer-scale transistor arrays with high carrier mobility, advancing semiconductor technology beyond silicon limits.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Two-dimensional materials offer potential for next-generation semiconductor devices.
- Black phosphorus (BP) is a promising layered semiconductor with tunable bandgap and high carrier mobility.
- Current limitations in large-scale BP synthesis hinder device development.
Purpose of the Study:
- To achieve centimeter-scale growth of ultrathin black phosphorus (BP).
- To fabricate large-scale field-effect transistor arrays using the synthesized BP.
- To evaluate the performance of BP-based transistors for potential applications.
Main Methods:
- Utilized pulsed laser deposition (PLD) for BP growth.
- Leveraged a unique plasma-activated region during laser ablation to facilitate BP cluster formation and transport.
- Fabricated large-scale field-effect transistor arrays on the centimeter-scale BP films.
Main Results:
- Successfully grew ultrathin BP on a centimeter scale.
- Achieved high hole mobility in fabricated field-effect transistors: up to 213 cm2 V-1 s-1 at 295 K and 617 cm2 V-1 s-1 at 250 K.
- Demonstrated the feasibility of large-scale BP-based wafer-scale devices.
Conclusions:
- Pulsed laser deposition enables scalable synthesis of ultrathin black phosphorus.
- The developed BP films support high-performance transistor arrays.
- This work paves the way for advanced electronic devices and information industry applications.

