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Highly efficient ultra-low blaze angle multilayer grating.

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    We developed a new method to precisely reduce the blaze angle of x-ray gratings for EUV and soft X-ray applications. This technique achieves extremely low blaze angles, enhancing diffraction efficiency for synchrotron sources and Free Electron Lasers.

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    Area of Science:

    • Optics and Photonics
    • Materials Science
    • X-ray Physics

    Background:

    • X-ray gratings are crucial optical components for spectral analysis.
    • Achieving high diffraction efficiency requires precise control over grating parameters, including blaze angle.
    • Existing methods for blaze angle modification are limited in accuracy and range.

    Purpose of the Study:

    • To develop an advanced process for reducing the blaze angle of x-ray gratings.
    • To enable precise adjustment of blaze angles to lower values for enhanced performance.
    • To demonstrate the efficacy of the process for soft, tender, and extreme ultraviolet (EUV) spectral ranges.

    Main Methods:

    • Developed a process involving planarization of anisotropically etched silicon blazed gratings.
    • Utilized a chemically selective plasma etch to further refine the blaze angle.
    • Fabricated and characterized 100 lines/mm gratings with Mo/Si multilayer coatings.

    Main Results:

    • Successfully reduced the blaze angle to an extremely low value of 0.04°±0.004°.
    • Achieved a high diffraction efficiency of 58% in the 1st diffraction order at 13.3 nm wavelength.
    • Demonstrated high accuracy in blaze angle adjustment.

    Conclusions:

    • The developed process offers a versatile method for blaze angle reduction in x-ray gratings.
    • This technique significantly enhances grating performance for soft X-ray and EUV applications.
    • The method is highly applicable to synchrotron sources and Free Electron Lasers (FELs).