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Related Concept Videos

MOSFET01:16

MOSFET

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The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) plays a pivotal role in modern electronics thanks to its versatility and efficiency in controlling electrical currents. This device, also known as IGFET, MISFET, and MOSFET, has three main terminals: the Source, Drain, and Gate. MOSFETs are classified into n-channel or p-channel types based on the doping characteristics of their substrate and the source or drain regions.
In an n-MOSFET, the structure includes n-type source and drain...
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MOSFET: Enhancement Mode01:22

MOSFET: Enhancement Mode

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Enhancement-mode MOSFETs are pivotal components in electronics, distinguished by their capacity to act as highly efficient switches. They are part of the larger family of metal-oxide Semiconductor Field-Effect Transistors (MOSFETs). They are available in two types: p-channel and n-channel, each tailored to specific polarity operations.
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Characteristics of MOSFET01:17

Characteristics of MOSFET

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Metal-oxide-semiconductor field-effect Transistors, or MOSFETs, play a critical role in electronic circuits. They are primarily utilized for amplifying and switching signals.
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MOSFET: Depletion Mode01:20

MOSFET: Depletion Mode

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Depletion-mode MOSFETs represent a unique subset of MOSFET technology, functioning fundamentally differently from their enhancement-mode counterparts. Unlike enhancement MOSFETs, which require a positive gate-source voltage (Vgs) to turn on, depletion-mode MOSFETs are inherently conductive and "normally on" devices.
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity...
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MOSFET Amplifiers01:17

MOSFET Amplifiers

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The MOSFET, when operating in its active region, functions as a voltage-controlled current source. In this region, the gate-to-source voltage controls the drain current. This principle underlies the operation of the transconductance MOSFET amplifier. The output current is directed through a load resistor to convert this amplifier into a voltage amplifier. The output voltage is then obtained by subtracting the voltage drop across the load resistance from the supply voltage. This process results...
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A Metal-Oxide-Semiconductor (MOS) capacitor is a fundamental structure used extensively in semiconductor device technology, particularly in the fabrication of integrated circuits and MOSFETs (metal-oxide-semiconductor field-effect transistors). The MOS capacitor consists of three layers: a metal gate, a dielectric oxide, and a semiconductor substrate.
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Ternary logic decoder using independently controlled double-gate Si-NW MOSFETs.

Seong-Joo Han1, Joon-Kyu Han1, Myung-Su Kim1

  • 1School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon, 34141, Republic of Korea.

Scientific Reports
|June 22, 2021
PubMed
Summary
This summary is machine-generated.

This study demonstrates a ternary logic decoder using independently controlled double-gate silicon-nanowire MOSFETs, confirming the feasibility of mixed radix systems. This approach overcomes limitations of traditional multi-threshold voltage schemes for ternary logic circuits.

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Area of Science:

  • Semiconductor device physics
  • Nanoelectronics
  • Digital logic design

Background:

  • Ternary logic decoders (TLDs) are crucial for mixed radix systems (MRS).
  • Conventional multi-threshold voltage (multi-Vth) schemes present limitations for TLD implementation.
  • Silicon-nanowire (Si-NW) field-effect transistors (FETs) offer potential for advanced logic circuits.

Purpose of the Study:

  • To demonstrate a ternary logic decoder (TLD) using independently controlled double-gate (ICDG) silicon-nanowire (Si-NW) MOSFETs.
  • To confirm the feasibility of mixed radix systems (MRS) employing this novel TLD design.
  • To resolve limitations associated with conventional multi-threshold voltage (multi-Vth) schemes in TLDs.

Main Methods:

  • Fabrication and characterization of ICDG Si-NW MOSFETs.
  • Semi-empirical modeling and fitting of electrical characteristics using SILVACO ATLAS TCAD simulator.
  • Mixed-mode TCAD simulations to analyze TLD circuit performance and power consumption.

Main Results:

  • The ICDG Si-NW MOSFETs were successfully fabricated and characterized.
  • Electrical characteristics were accurately modeled and fitted.
  • The TLD achieved a power-delay product of 35 aJ for a 500 nm gate length and 0.16 aJ for a 14 nm gate length.

Conclusions:

  • The demonstrated TLD based on ICDG Si-NW MOSFETs is a feasible component for mixed radix systems.
  • This approach overcomes limitations of conventional multi-Vth schemes.
  • The CMOS-compatible and scalable nature of these MOSFETs makes them promising for future ternary and binary logic MRS.