Ferromagnetism
Fermi Level
Dielectric Polarization in a Capacitor
Valence Bond Theory
Ionic Crystal Structures
Crystal Field Theory - Octahedral Complexes
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Updated: Oct 31, 2025

A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
Published on: April 8, 2018
Anastasia Chouprik1, Dmitrii Negrov, Evgeny Y Tsymbal
1Moscow Institute of Physics and Technology, Dolgoprudny, Moscow region, Russia. zenkevich.av@mipt.ru.
Point defects and structural phase polymorphism in ferroelectric hafnium oxide (HfO2) thin films critically impact memory device performance. Understanding these defects is key to developing competitive HfO2-based non-volatile memory.
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