Halide-induced Step Faceting and Dissolution Energetics from Atomistic Machine Learned Potentials on Cu(100).

Mitchell C Groenenboom1, Thomas P Moffat1, Kathleen A Schwarz1

  • 1Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899-8520 USA.

Summary

Chlorine adsorbates on copper surfaces alter step structures and reactivity. This study uses density functional theory (DFT) and neural networks to reveal how chlorine influences copper’s dissolution and deposition behavior at the atomic level.

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