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Updated: Oct 23, 2025

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High-harmonic generation in metallic titanium nitride.

A Korobenko1, S Saha2, A T K Godfrey3

  • 1Joint Attosecond Science Laboratory, National Research Council of Canada and University of Ottawa, Ottawa, ON, Canada. akoroben@uottawa.ca.

Nature Communications
|August 18, 2021
PubMed
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This summary is machine-generated.

High-harmonic generation was achieved in metallic titanium nitride films using intense laser pulses. This breakthrough enables new possibilities for compact vacuum ultraviolet sources and refractory plasmonic devices.

Area of Science:

  • Nonlinear optics
  • Solid-state physics
  • Materials science

Background:

  • High-harmonic generation (HHG) is a fundamental process in nonlinear optics, previously observed in various materials but not metals.
  • Metals are challenging for HHG due to their high carrier densities and potential for damage under intense laser fields.

Purpose of the Study:

  • To demonstrate high-harmonic generation in a metallic material.
  • To investigate the potential of titanium nitride for HHG and related applications.
  • To explore the influence of material properties on HHG in metals.

Main Methods:

  • Irradiation of titanium nitride films with 800-nm ultrashort laser pulses at intensities up to 13 TW/cm².
  • Measurement of emitted vacuum ultraviolet (VUV) radiation.

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  • Analysis of VUV emission as a function of crystal orientation relative to laser polarization.

    • Main Results:

    • Successful generation of high harmonics up to 11 eV photon energy from metallic titanium nitride.
    • Titanium nitride demonstrated high laser damage threshold, withstanding few-cycle pulses at high intensities.
    • Observed anisotropy in VUV emission correlated with the electronic band structure of titanium nitride.

    Conclusions:

    • First demonstration of high-harmonic generation in a metal (titanium nitride).
    • HHG in metals bridges the gap between solid-state and plasma harmonic generation.
    • Titanium nitride is a promising material for refractory plasmonics and compact VUV frequency combs.