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Room-Temperature, Low-Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers
1Department of Electrical Engineering and Computer Science, The University of Michigan, 1301 Beal Ave., Ann Arbor, MI 48109, USA.
Advanced Materials (Deerfield Beach, Fla.)
|August 20, 2021
Abstract:
A new UV-curable liquid resist based on cationic polymerization of silicone epoxies has been developed for UV-assisted nanoimprint lithography. Uniform films with thicknesses ranging from below 50 nm to over 1 μm can be easily spin-coated using a suitable undercoating layer on a substrate. Patterns with feature sizes ranging from tens of micrometers to 20 nm are imprinted at room temperature with a pressure of less than 0.1 MPa.
