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Related Experiment Video

Updated: Oct 21, 2025

Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography
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Patterning of Complex, Nanometer-Scale Features in Wide-Area Gold Nanoplasmonic Structures Using Helium Focused Ion

Mitchell Semple1, Aaron C Hryciw2, Peng Li2

  • 1Electrical and Computer Engineering, University of Alberta, Edmonton, Alberta T6G 1H9, Canada.

ACS Applied Materials & Interfaces
|September 2, 2021
PubMed
Summary

Helium ion beam milling enables precise fabrication of nanoplasmonic metasurfaces. This technique reliably creates 10 nm gold features with complex geometries for advanced plasmonics research.

Keywords:
focused ion beamhelium ion microscopemetasurfacenanoscale patterningplasmonicssputtering

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Area of Science:

  • Nanotechnology
  • Materials Science
  • Optics

Background:

  • Plasmonics research demands advanced nanopatterning for precise control of surface plasmon properties.
  • Nanoplasmonic metasurfaces require high-fidelity, intricate features over large areas, posing significant fabrication challenges.

Purpose of the Study:

  • To systematically investigate helium focused ion beam (He-FIB) milling for fabricating nanoplasmonic metasurfaces.
  • To demonstrate the capability of He-FIB milling for creating complex, nanometer-scale features in gold films.

Main Methods:

  • Utilized helium focused ion beam milling to pattern gold films.
  • Fabricated a nanoplasmonic metasurface comprising an array of nanometer-scale plasmonic-wire-loaded subwavelength apertures.
  • Compared experimental pattern variations with simulations to predict outcomes.

Main Results:

  • Demonstrated reliable patterning of 10 nm features in gold using He-FIB milling.
  • Achieved a 1:5 aspect ratio for the fabricated features.
  • Successfully reproduced complex geometries over a wide area in a practical fabrication setting.

Conclusions:

  • Helium ion beam milling is a viable technique for advanced nanoplasmonic metasurface fabrication.
  • The method offers high precision and reliability for creating intricate nanostructures required in plasmonics.